Optosystems LTD

Microwave plasma chemical vapor deposition system ARDIS 300 is designed and produced by the company “OPTOSYSTEMS” — the leading Russian manufacturer of laser equipment for medicine, science and technology.


ARDIS 300

Microwave plasma system ARDIS 100 is designed for chemical vapor deposition of poly-, mono- and nanocrystalline diamond films. Carbon nanotubes and nanowires can also be produced.


PRINCIPLE OF OPERATION

The basic principle of operation is the deposition of a synthetic diamond from a plasma formed by a microwave discharge.

 

APPLICATION

GEMS


ELECTRONICS


OPTICS


ECOLOGY


MEDICINE

  • Growing diamonds by deposition from the gas phase allows to obtain diamond samples of previously inaccessible sizes, high purity, having a unique set of electronic, optical, thermal, mechanical properties.

  • This causes their demand and great prospects for use in such industries as electronics, optics, microwave technology, micromechanics, material processing, electrochemistry.

FEATURES AND BENEFITS



  • High vacuum and low leakage from the atmosphere
  • Large range of working pressure 6-500 Torr significantly increases the rate of growth of monohydrate
  • Stable plasma for a wide range of pressures, power and substrate geometry
  • Two wave pyrometer in the range 600-2300 0C. High-precision temperature measurement
  • Measuring the temperature of the sample avoiding the plasma
  • Video monitoring of the growing sample
  • Fully automated system monitoring and control. Control and diagnostics via the Internet
  • ARDIS-300 is designed as a single integrated module. Easy access for service and maintenance
  • BIAS for nucleation
  • Substrate holder for growth plate diameters up to 4”
  • Temperature uniformity in the substrate is < ±10%
  • A movable substrate holder for growth of single crystals by adjusting the rate of displacement feedback
  • Viewing window at an angle to the plasma using CF window
  • The reactor is made of metal. There is no plasma contact with the quartz separator of the vacuum volume, which significantly reduces the presence of mixture in the reactor during growth.
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Power


Three-Phase, 380/220 V, 50 Hz
Power consumption up to 12 kW
Emergency shut-off button


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DIMENSOIN


The total weight of the system is not more than 450 kg.
Dimensions (length × width × height) 1660×880×1840 mm


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HARDWARE AND SOFTWARE


Industrial panel PC
Program control of parameters
Windows operating system


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PREMISES REQUIREMENTS


Minimum area of 10 m2
Minimum height of 3.5 m
The width of the door opening at least 950 mm


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OPTIONS


Vertical movement of the Central part of the table
A two-beam pyrometer
DC Bias to the substrate holder In the 0-300 V or 0-600 V