Microwave plasma chemical vapor deposition system ARDIS 300 is designed and produced by the company “OPTOSYSTEMS” — the leading Russian manufacturer of laser equipment for medicine, science and technology.
Microwave plasma system ARDIS 100 is designed for chemical vapor deposition of poly-, mono- and nanocrystalline diamond films. Carbon nanotubes and nanowires can also be produced.
PRINCIPLE OF OPERATION
The basic principle of operation is the deposition of a synthetic diamond from a plasma formed by a microwave discharge.
Growing diamonds by deposition from the gas phase allows to obtain diamond samples of previously inaccessible sizes, high purity, having a unique set of electronic, optical, thermal, mechanical properties.
This causes their demand and great prospects for use in such industries as electronics, optics, microwave technology, micromechanics, material processing, electrochemistry.
FEATURES AND BENEFITS
Three-Phase, 380/220 V, 50 Hz
Power consumption up to 12 kW
Emergency shut-off button
The total weight of the system is not more than 450 kg.
Dimensions (length × width × height) 1660×880×1840 mm
HARDWARE AND SOFTWARE
Industrial panel PC
Program control of parameters
Windows operating system
Minimum area of 10 m2
Minimum height of 3.5 m
The width of the door opening at least 950 mm
Vertical movement of the Central part of the table
A two-beam pyrometer
DC Bias to the substrate holder In the 0-300 V or 0-600 V