ARDIS 100

Microwave plasma chemical vapor deposition system for high quality poly-, mono- and nanocrystalline diamond films.

Microwave plasma system ARDIS 100 is designed for chemical vapor deposition of poly-, mono- and nanocrystalline diamond films. Carbon nanotubes and nanowires can also be produced.

Chemical Vapor Deposition method allows synthesizing high purity diamond films with earlier unachievable dimensions possessing unique optical, mechanical, electronic and thermal properties.